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[問題求助] CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?

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發表於 2012-2-9 13:24:53 | 顯示全部樓層
在EDA Board 抓的資訊, 參考一下:
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I believe that what you are getting at is that there is a specific structure of P+/Nwell/Psub that is used for
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0 {/ m2 y% R4 K& R. R/ P* \the "bipolar", so you are asking why use that structure rather than simply a P+/Nwell "diode". Here is my take 1 m! K0 K5 r6 Y/ N3 d( m& K5 [* g

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  q$ [8 P+ E3 I
1- The "bipolar" will simulate more accurately than the "diode", since it will include the substrate current 7 e" c/ q) p8 t
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that is probably not modeled for the "diode".: V/ e5 J% u$ p/ @
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2- There usually is a specific structure for the "bipolar" that has characterization data available. When
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building a bandgap structure, the good characterization is needed in order to properly determine the tempco of
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3 `! U+ [/ }7 n* H3 C2 Lthe Base-emitter voltage.5 G4 j! {* `) o) T
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3- The additional structure of the bipolar should help prevent current injection into other substrate tied 5 G& J- L# @2 q! s

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There is, of course, nothing preventing the use of a P+/Nwell diode in your application.
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