NLDD與NDD

hyseresis

想請問一下各位:
5 x+ m1 ]# S% C9 [) S) Y* ~NLDD與NDD這兩層layer是做什摩用的??
# P- f/ a) y* M# r9 ]在layout上要注意什麼?
如能解答,必定感謝

tcsungeric

NLDD is a N-type lightly doped drain (implant layer) for E-field reduction @drain or source site especially for general submicro process.
: I4 q8 W8 a0 o; t$ n6 wNDD is a N-type double diffusion drain (implant layer for current technology) for E-field reduction @drain or source site (depend on asymmetric or symmetric device structure) especially for high voltage process. No special layout concern, just follow DRM.