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標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管? [打印本頁]

作者: scy8080    時間: 2012-2-3 02:59 PM
標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
作者: hoodlum    時間: 2012-2-3 10:59 PM
小弟的看法是' ]+ U! e; w7 J$ R4 n5 R
會不會是標準CMOS的製程裡/ G, B% c  d. a8 o3 Y$ }9 K2 b5 i, L  i
無法做出二極體, 只能用寄生的& e  W$ c, t$ b3 ~5 r/ T8 ~
vertical PNP呢???
作者: leo911759    時間: 2012-2-8 04:02 PM
其實也是有的。
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5 p9 w9 ]8 m' M% s  R2 ]有一些Paper就是用Diode,或是NPN。8 T, N6 G9 c9 I. [+ v

( k2 {9 L5 z: r6 z8 {而會用PNP 是因為早期CMOS製程中,只能寄生等效PNP電路。
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3 ^+ B5 M' B: s其中的寄生等效Diode會有Latch-up的問題。; h& G. V+ T) }, \+ S+ y
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這是製程受限的關係,比較先進的製程就沒這種問題了。
作者: patrick02046    時間: 2012-2-9 01:24 PM
在EDA Board 抓的資訊, 參考一下:& c6 d3 A9 W. T# P2 ~8 D1 ~

5 t8 m$ j* Y2 L2 u1 b+ U5 o& SI believe that what you are getting at is that there is a specific structure of P+/Nwell/Psub that is used for 4 M1 h6 @$ s1 l0 z( F: O1 [: ^
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the "bipolar", so you are asking why use that structure rather than simply a P+/Nwell "diode". Here is my take
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on this:7 Y. V6 P2 h  |. J7 g  Q4 C! v

! P8 h8 l# f# o% M! s  H3 y/ Y" _1- The "bipolar" will simulate more accurately than the "diode", since it will include the substrate current 0 V2 W* G- v. p) H  r0 c2 b! j2 w

6 O+ B* D. i5 i7 q7 wthat is probably not modeled for the "diode".( X2 `9 o6 A' g$ W+ }
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2- There usually is a specific structure for the "bipolar" that has characterization data available. When ' i* C0 K5 c! @- r" R/ {

6 F4 T' @: u  m; m0 a: Tbuilding a bandgap structure, the good characterization is needed in order to properly determine the tempco of * e& |8 s4 a/ [$ X: Y" e0 J$ m1 {: B( C
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the Base-emitter voltage.9 L- j5 f1 e; b5 I
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3- The additional structure of the bipolar should help prevent current injection into other substrate tied 7 `& T' Q" M( v; Y. G

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: X8 W+ v. f# B2 R7 [) p0 f$ i9 P6 FThere is, of course, nothing preventing the use of a P+/Nwell diode in your application.
作者: luckyhuihui666    時間: 2012-4-13 08:06 PM
主要原因就是二极管不准确……




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